%0 Journal Article
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%@nexthigherunit 8JMKD3MGPCW/3ESR3H2
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%3 deposition of hard.pdf
%X Hard amorphous hydrogenated carbon (a-C:H) films were deposited by plasma decomposition of CH4 gas in a RF parallel-plate hollow-cathode system. The deposition system was built by placing a metallic plate in parallel to and in electrical contact with an usual RF-PECVD planar cathode. Self-bias versus RF power curves were used to make an initial characterization of plasma discharges in nitrogen gas atmospheres, for pressures between 10 and 100 mTorr. The strongly increased power consumption to obtain the same self-bias in the hollow-cathode system evidenced an increase in plasma density. The a-C:H films were deposited onto Si single crystalline substrates, in the − 50 to − 500 V self-bias range, at 5, 10 and 50 mTorr deposition pressures. The film deposition rate was found to be about four times than that usually observed for single-cathode RF-PECVD-deposited films, under methane atmosphere, at similar pressure and self-bias conditions. Characterization of film structure was carried out by Raman spectroscopy on films deposited at 10 and 50 mTorr pressures. Gaussian deconvolution of the Raman spectra in its D and G bands shows a continuous increase in the ID/IG integrated band intensity ratio upon self-bias increase, obeying the expected increasing behavior of the sp2 carbon atom fraction. The peak position of the G band was found to increase up to − 300 V self-bias, showing a nearly constant behavior for higher self-bias absolute values. On the other hand, the G band width showed a nearly constant behavior within the entire self-bias range. Nanohardness measurements have shown that films deposited with self-bias greater than 300 V are as hard as films obtained by the usual PECVD techniques, showing a maximum hardness of about 18 GPa. Films were also found to develop high internal compressive stress. The stress dependence on self-bias showed a strong maximum at about − 200 V self-bias, with a maximum stress value of about 5 GPa.
%8 Mar.
%N 3
%T Deposition of hard amorphous hydrogenated carbon films by radiofrequency parallel-plate hollow-cathode plasmas
%@secondarytype PRE PI
%K Hollow-cathode, Plasma deposition, Amorphous hydrogenated carbon, Mechanical properties.
%@visibility shown
%@group LAS-INPE-MCT-BR
%@secondarykey INPE-15046-PRE/9957
%@copyholder SID/SCD
%2 sid.inpe.br/mtc-m17@80/2007/12.06.18.37.25
%@affiliation Instituto Nacional de Pesquisas Espaciais (INPE)
%@affiliation Materials Science & Technology Division, Los Alamos National Laboratory
%@affiliation Departamento de Física, Universidade Federal do Paraná
%@affiliation Departamento de Física, Universidade Federal do Paraná
%@affiliation Instituto de Física, Universidade Federal Fluminense
%@affiliation Instituto de Física, Universidade Federal Fluminense
%B Diamond and Related Materials
%P 626-622
%4 sid.inpe.br/mtc-m17@80/2007/12.06.18.37
%D 2007
%V 16
%@doi 10.1016/j.diamond.2006.11.052
%A Capote, Gil,
%A Jacobsohn, L. G.,
%A Michel, M. D.,
%A Lepienski, C. M.,
%A Vieira, A. L.,
%A Franceschini, D. F.,
%@dissemination WEBSCI; PORTALCAPES; COMPENDEX.
%@area FISMAT