%0 Journal Article %@holdercode {isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S} %@nexthigherunit 8JMKD3MGPCW/3ET2RFS %@resumeid 8JMKD3MGP5W/3C9JHDC %@archivingpolicy denypublisher denyfinaldraft24 %@usergroup administrator %@usergroup simone %3 plasma immersion.pdf %X The influence of low magnetic fields (B ¡Ü 130 G) on the plasma parameters of a DC nitrogen glow discharge is investigated with a double Langmuir probe. The discharge was optimized for maximum plasma density for different values of a magnetic field, and a condition was found in which density was enhanced by an order of magnitude. In this condition partial suppression of secondary electron emission was obtained during ion implantation experiments. Silicon samples implanted in this optimum density condition showed larger retained dose and penetration depth compared with samples treated in non-magnetized plasmas as shown by Auger electron spectroscopy depth profile analysis. These results were compared with previous similar experiments in much denser magnetized vacuum arc plasmas, in which total suppression of secondary electrons (SE) was obtained, corroborating the theory that the maintenance of a virtual cathode for SE suppression is favored by higher plasma density. Silicon samples implanted in magnetized magnesium plasmas exhibited much larger doses (as expected) and penetration depths (not so obvious) than the ones treated in non-magnetized plasmas. The deeper ion penetration obtained in magnetized gaseous and vacuum arc plasmas indicates that an enhanced diffusion may be taking place induced by the large ion bombardment in dense plasmas. %8 Feb. %N 9/11 %T Plasma immersion ion implantation in arc and glow discharge plasmas submitted to low magnetic fields %@secondarytype PRE PI %K Plasma immersion ion implantation (PIII), Vacuum arc, Magnetic suppression, Double probes. %@visibility shown %@group LAP-INPE-MCT-BR %@group LAP-INPE-MCT-BR %@group LAP-INPE-MCT-BR %@group LAP-INPE-MCT-BR %@secondarykey INPE-14763-PRE/9734 %@copyholder SID/SCD %@issn 0257-8972 %2 sid.inpe.br/mtc-m17@80/2006/12.05.17.37.16 %@affiliation Instituto Nacional de Pesquisas Espaciais (INPE) %@affiliation Instituto Nacional de Pesquisas Espaciais (INPE) %@affiliation Instituto Nacional de Pesquisas Espaciais (INPE) %@affiliation Instituto Nacional de Pesquisas Espaciais (INPE) %@affiliation Research Center Rossendorf, Institute of Ion Beam Physics and Materials Research %B Surface and Coatings Technology %P 4826-4831 %4 sid.inpe.br/mtc-m17@80/2006/12.05.17.37 %D 2007 %V 201 %A Tan, Ing Hwie, %A Ueda, M¨¢rio, %A Oliveira, Rogerio Moares de, %A Dallaqua, Renato S¨¦rgio, %A Reuther, H., %@dissemination WEBSCI; PORTALCAPES. %@area FISPLASMA