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1. Identificação
Tipo de ReferênciaArtigo em Revista Científica (Journal Article)
Sitemtc-m16b.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador6qtX3pFwXQZGivnK2Y/UugL7
Repositóriosid.inpe.br/mtc-m17@80/2008/06.17.13.57   (acesso restrito)
Última Atualização2008:06.17.13.57.55 (UTC) administrator
Repositório de Metadadossid.inpe.br/mtc-m17@80/2008/06.17.13.57.56
Última Atualização dos Metadados2018:06.05.03.30.51 (UTC) administrator
Chave SecundáriaINPE--PRE/
DOI10.1016/j.tsf.2007.08.007
ISSN0040-6090
Chave de CitaçãoGilBonSanTraCor:2008:AdAmHy
TítuloAdherent amorphous hydrogenated carbon films on metals deposited by plasma enhanced chemical vapor deposition
Ano2008
MêsApr.
Data de Acesso07 maio 2024
Tipo SecundárioPRE PI
Número de Arquivos1
Tamanho621 KiB
2. Contextualização
Autor1 Gil, Capote
2 Bonetti, Luis Fernando
3 Santos, Lúcia Vieira
4 Trava Airoldi, Vladimir Jesus
5 Corat, Evaldo José
Identificador de Curriculo1
2
3
4 8JMKD3MGP5W/3C9JJBK
Grupo1 LAS-CTE-INPE-MCT-BR
2 LAS-CTE-INPE-MCT-BR
3 LAS-CTE-INPE-MCT-BR
4 LAS-CTE-INPE-MCT-BR
5 LAS-CTE-INPE-MCT-BR
Afiliação1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Nacional de Pesquisas Espaciais (INPE)
5 Instituto Nacional de Pesquisas Espaciais (INPE)
RevistaThin Solid Films
Volume516
Número12
Páginas4011-4017
Histórico (UTC)2008-06-17 13:57:56 :: simone -> administrator ::
2012-07-13 22:33:00 :: administrator -> simone ::
2013-02-20 15:20:20 :: simone -> administrator :: 2008
2018-06-05 03:30:51 :: administrator -> marciana :: 2008
3. Conteúdo e estrutura
É a matriz ou uma cópia?é a matriz
Estágio do Conteúdoconcluido
Transferível1
Tipo do ConteúdoExternal Contribution
Palavras-Chaveamorphous hydrogenated carbon
plasma enhanced chemical vapor deposition
silicon interlayer
adhesion
X-ray photoelectron spectra
mechanical properties
ResumoThis paper reports the findings of a study of the structural, mechanical, and tribological properties of amorphous hydrogenated carbon (a-C:H) coatings for industrial applications. These thin films have proven quite advantageous in many tribological applications, but for others, thicker films are required. In this study, in order to overcome the high residual stress and low adherence of a-C:H films on metal substrates, a thin amorphous silicon interlayer was deposited as an interface. Amorphous silicon and a-C:H films were grown by using a radio frequency plasma enhanced chemical vapor deposition system at 13.56 MHz in silane and methane atmospheres, respectively. The X-ray photoelectron spectroscopy technique was employed to analyze the chemical bonding within the interfaces. The chemical composition and atomic density of the a-C:H films were determined by ion beam analysis. The film microstructure was studied by means of Raman scattering spectroscopy. The total stress was determined through the measurement of the substrate curvature, using a profilometer, while micro-indentation experiments helped determine the films' hardness. The friction coefficient and critical load were evaluated by using a tribometer. The results showed that the use of the amorphous silicon interlayer improved the a-C:H film deposition onto metal substrates, producing good adhesion, low compressive stress, and a high degree of hardness. SiC was observed in the interface between the amorphous silicon and a-C:H films. The composition, the microstructure, the mechanical and tribological properties of the films were strongly dependent on the self-bias voltages. The tests confirmed the importance of the intensity of ion bombardment during film growth on the mechanical and tribological properties of the films. (c) 2007 Elsevier B.V. All rights reserved.
ÁreaFISMAT
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4. Condições de acesso e uso
Idiomaen
Arquivo Alvoadherent amorphous.pdf
Grupo de Usuáriosadministrator
simone
Visibilidadeshown
Política de Arquivamentodenypublisher denyfinaldraft24
Permissão de Leituradeny from all and allow from 150.163
5. Fontes relacionadas
Unidades Imediatamente Superiores8JMKD3MGPCW/3ESR3H2
DivulgaçãoWEBSCI; PORTALCAPES.
Acervo Hospedeirolcp.inpe.br/ignes/2004/02.12.18.39
cptec.inpe.br/walmeida/2003/04.25.17.12
6. Notas
Campos Vaziosalternatejournal archivist callnumber copyholder copyright creatorhistory descriptionlevel documentstage e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project readergroup rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype
7. Controle da descrição
e-Mail (login)marciana
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